Lasertec是日本半导体检测设备龙头，1960 年创立，总部位于横滨，东证上市（6920）。核心产品为EUV 掩模检查机（如 ACTIS A300）、晶圆检测设备、FPD 掩模检查机及激光显微镜
真 EUV 波长检查（Actinic）
光源：13.5 nm EUV 等离子光源（非 DUV 替代）
优势：检出只有 EUV 能看到的可转写缺陷（如 EUV 专属相位缺陷），DUV 机台看不见
带保护膜（Pellicle）直通检查
支持带 / 不带 EUV 保护膜的掩模直接检查，不用拆 pellicle
避免拆膜造成的污染 / 损伤，匹配量产流程
高灵敏度
检测极限：≤15 nm 级致命缺陷（EUV 图案）
远优于传统 DUV 检查（≥50 nm）
关键能力
检查对象：EUV 掩模（152×152 mm）
缺陷类型：图案缺失 / 凸起、微粒、相位异常、反射率不均等晶圆致命缺陷
吞吐量：每日数片 EUV 掩模（量产级）
Lasertec is a manufacturer of semiconductor mask inspection systems with a long history and abundant experience in this field. The company developed the world’s first automated photomask inspection system in 1976. The current series of mask inspection system, MATRICS Series, is widely used among wafer fabs and mask shops worldwide and renowned for its high detection performance.
EUV lithography is the most advanced semiconductor lithography being introduced to commercial production at leading-edge fabs to enable the further scaling of device patterns. To meet a whole range of requirements for EUV mask inspection, Lasertec released BASIC Series EUV Mask Backside Inspection and Cleaning System in 2013, ABICS E120 EUV Mask Blanks Inspection and Review System in 2017, and MATRICS X8ULTRA Series Mask Inspection System in 2018.
As the development of an actinic EUV patterned mask inspection system has remained one of the major challenges for the industry to complete the tooling set needed for EUV mask making to drive and support wafer yield, Lasertec is proud to close the gap in time for EUV adoption in High Volume Manufacturing.
The newly developed ACTIS A150 is the world’s first actinic EUV patterned mask inspection system. It draws on the expertise Lasertec has accumulated through many years of experience in patterned mask inspection and inspection with EUV light. Since EUV has a much shorter wavelength than deep ultraviolet (DUV), ACTIS A150 achieves extremely high defect sensitivity, delivering far greater performance than conventional mask inspection systems using DUV laser. Another key advantage of ACTIS A150 is its capability to detect printable defects not detectable with DUV-based mask inspection systems, including phase defects unique to EUV masks.
Lasertec will provide a whole range of EUV mask inspection systems to support leading-edge manufacturers adopting EUV lithography in commercial production, thereby facilitating technological advancements in the semiconductor industry.
Lasertec是日本半导体检测设备龙头，1960 年创立，总部位于横滨，东证上市（6920）。核心产品为EUV 掩模检查机（如 ACTIS A300）、晶圆检测设备、FPD 掩模检查机及激光显微镜
-
光源：13.5 nm EUV 等离子光源（非 DUV 替代）
-
优势：检出只有 EUV 能看到的可转写缺陷（如 EUV 专属相位缺陷），DUV 机台看不见
-
支持带 / 不带 EUV 保护膜的掩模直接检查，不用拆 pellicle
-
避免拆膜造成的污染 / 损伤，匹配量产流程
-
检测极限：≤15 nm 级致命缺陷（EUV 图案）
-
远优于传统 DUV 检查（≥50 nm）
-
检查对象：EUV 掩模（152×152 mm）
-
缺陷类型：图案缺失 / 凸起、微粒、相位异常、反射率不均等晶圆致命缺陷
-
吞吐量：每日数片 EUV 掩模（量产级）
Lasertec is a manufacturer of semiconductor mask inspection systems with a long history and abundant experience in this field. The company developed the world’s first automated photomask inspection system in 1976. The current series of mask inspection system, MATRICS Series, is widely used among wafer fabs and mask shops worldwide and renowned for its high detection performance.
EUV lithography is the most advanced semiconductor lithography being introduced to commercial production at leading-edge fabs to enable the further scaling of device patterns. To meet a whole range of requirements for EUV mask inspection, Lasertec released BASIC Series EUV Mask Backside Inspection and Cleaning System in 2013, ABICS E120 EUV Mask Blanks Inspection and Review System in 2017, and MATRICS X8ULTRA Series Mask Inspection System in 2018.
As the development of an actinic EUV patterned mask inspection system has remained one of the major challenges for the industry to complete the tooling set needed for EUV mask making to drive and support wafer yield, Lasertec is proud to close the gap in time for EUV adoption in High Volume Manufacturing.
The newly developed ACTIS A150 is the world’s first actinic EUV patterned mask inspection system. It draws on the expertise Lasertec has accumulated through many years of experience in patterned mask inspection and inspection with EUV light. Since EUV has a much shorter wavelength than deep ultraviolet (DUV), ACTIS A150 achieves extremely high defect sensitivity, delivering far greater performance than conventional mask inspection systems using DUV laser. Another key advantage of ACTIS A150 is its capability to detect printable defects not detectable with DUV-based mask inspection systems, including phase defects unique to EUV masks.
Lasertec will provide a whole range of EUV mask inspection systems to support leading-edge manufacturers adopting EUV lithography in commercial production, thereby facilitating technological advancements in the semiconductor industry.
